The device is a spinous process fixation device which features an angle on each ventral plate to improve anatomic fit at L5-S1 by conforming to the sacral anatomy.

The flared angle also allows the implant to fixate at the laminar junction of any level for anterior placement and optimal bony engagement.

Barrow Neurological Institute Randall Porter said the Aspen Flared 5-1 design offers the benefits of minimally invasive Aspen spinous process fixation to patients with instability at this level, and the ability for ventral implant placement ensures optimal fixation to the bone at the base of the spinous process.

The Aspen family other products include the standard Aspen, Aspen Medium and LPlate Low Profile implants which are designed to accommodate different patient anatomies with a variety of shapes and sizes.

Aspen devices are intended for single level use in the non-cervical spine (T1-S1) to treat degenerative disc disease, spondylolisthesis, spinal trauma or spinal tumor.